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Computer Aided Engineering of Semi-conductor Integrated Circuits (1977)

Defense Technical Information Center · leaf 227

An illustration from Computer Aided Engineering of Semi-conductor Integrated Circuits, 1977, leaf 227
SOURCE OXIDES DRAIN p- SUBSTRATE ^ CHANNEL LENGTH ^CHANNEL … ia) Cross-secticr. of an n-channel MOSFET. (b) Sectancrular region mcdeied. The abrupt nietallur junctions between source-substrate and drain- subsrrate are regarded as planar and at the lett and right borders of the reaion ncdeled.

Kennedy, David P · Florida univ gainesville electron device research center · Computer aided design · Integrated circuits · Solid state electronics · Computer programs · Cost effectiveness · Field effect transistors · Mathematical models · Metal oxide semiconductors · Model theory · Semiconductor devices

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